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#Vertical metal scribe pdf#

H01L21/00- Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof.

H01L- SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10.XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2.239000004973 liquid crystal related substance Substances 0.000 description 2.239000008187 granular material Substances 0.000 description 2.-1 for example Substances 0.000 description 2.REDXJYDRNCIFBQ-UHFFFAOYSA-N aluminium(3+) Chemical class REDXJYDRNCIFBQ-UHFFFAOYSA-N 0.000 description 2.229910045601 alloy Inorganic materials 0.000 description 2.229910003460 diamond Inorganic materials 0.000 description 6.

238000010438 heat treatment Methods 0.000 claims description 6.

238000003384 imaging method Methods 0.000 claims description 36.

238000004519 manufacturing process Methods 0.000 claims abstract description 14.

238000005755 formation reaction Methods 0.000 claims abstract description 54.

230000015572 biosynthetic process Effects 0.000 claims abstract description 54.

239000010703 silicon Substances 0.000 claims abstract description 192.

229910052710 silicon Inorganic materials 0.000 claims abstract description 192.

XUIMIQQOPSSXEZ-UHFFFAOYSA-N silicon Chemical compound XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 192.

239000004065 semiconductor Substances 0.000 title claims abstract description 196.

Assignors: WAKAYAMA, HARUO Publication of US20040214408A1 publication Critical patent/US20040214408A1/en Application granted granted Critical Publication of US7015118B2 publication Critical patent/US7015118B2/en Adjusted expiration legal-status Critical Status Expired - Fee Related legal-status Critical Current Links ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). reassignment MITSUBOSHI DIAMOND INDUSTRIAL CO., LTD.

Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority claimed from JP2001335149 external-priority Application filed by Mitsuboshi Diamond Industrial Co Ltd filed Critical Mitsuboshi Diamond Industrial Co Ltd Assigned to MITSUBOSHI DIAMOND INDUSTRIAL CO., LTD. Original Assignee Mitsuboshi Diamond Industrial Co Ltd Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.) ( en Inventor Haruo Wakayama Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.) Expired - Fee Related, expires Application number US10/483,353 Other versions US20040214408A1

#Vertical metal scribe pdf#

Google Patents Method for forming a scribe line on a semiconductor device and an apparatus for forming the scribe lineĭownload PDF Info Publication number US7015118B2 US7015118B2 US10/483,353 US48335304A US7015118B2 US 7015118 B2 US7015118 B2 US 7015118B2 US 48335304 A US48335304 A US 48335304A US 7015118 B2 US7015118 B2 US 7015118B2 Authority US United States Prior art keywords semiconductor wafer scribe line silicon wafer semiconductor wafer Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents US7015118B2 - Method for forming a scribe line on a semiconductor device and an apparatus for forming the scribe line US7015118B2 - Method for forming a scribe line on a semiconductor device and an apparatus for forming the scribe line